12 units
Basic fabrication processes for integrated circuits, with emphasis on monolithic silicon processing. Topics include: bulk crystal growth, point defects, oxidation, diffusion, epitaxy, ion implantation, thin film deposition, photolithography, plasma deposition and etching, low temperature and molecular beam epitaxy, rapid thermal annealing, MOS and bipolar process integration, and process diagnostics. Technological limitations and practical aspects of IC fabrication will be stressed.
4 hrs. lec.
Prerequisite: 18-412 or permission of instructor
Last updated on April 11, 2006
Applied Physics
Applied Physics (Solid State/Magnetics/Fields)
S05, F02, S02, F01, S01, S00, S99, S98
Please note that the course history information is incomplete and/or may reflect different courses offered under the same course number.